News

Hubei Dinglong starts operations at 300-ton annual capacity photoresist plant in China

Wednesday, March 25, 2026 at 11:20 AM

Hubei Dinglong has commenced operations at a new photoresist factory in China with an annual capacity of 300 tons. The facility is fully integrated, covering the entire production lifecycle from monomer organic synthesis and polymer synthesis to purification and final blending.

Context

On March 20, 2026, Hubei Dinglong announced the commencement of mass production at China’s first full-process photoresist facility in Qianjiang. The plant features an annual capacity of 300 tons of KrF and ArF photoresists, which are critical light-sensitive polymers used in the lithography process for high-end memory chips like 3D NAND and DRAM, as well as logic chips at 14nm nodes and below. This development is a strategic milestone for China’s semiconductor self-sufficiency. Currently, the domestic market share for Chinese-made KrF and ArF resists is estimated at only 3% to 5% and less than 1% respectively, with the global supply chain heavily dominated by Japanese and U.S. suppliers. By localizing the entire production cycle—from monomer synthesis to final formulation and purification—Hubei Dinglong aims to mitigate supply chain vulnerabilities for major domestic foundries and memory manufacturers.

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