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JX Advanced Metals completes mass production setup for high-purity CVD and ALD materials in Ibaraki
Friday, March 6, 2026 at 09:08 AM
JX Advanced Metals has finished setting up a mass production line for high-purity CVD and ALD materials at its Ibaraki Hitachi site. The company is now manufacturing molybdenum compounds used in 3D-NAND production at both its own Hitachi facility and Toho Titanium's Chigasaki plant.
Context
The Japanese materials giant JX Advanced Metals has finalized the mass production setup for its high-purity CVD and ALD materials at its Ibaraki facility. This expansion follows a strategic investment at the Chigasaki Plant of its subsidiary, Toho Titanium, where production of molybdenum compounds for 3D-NAND memory has also commenced. By integrating Toho Titanium’s specialized chlorination and melting technologies, JX Advanced Metals aims to secure a vertically integrated supply chain for the ultra-pure precursors required for next-generation chip architectures.
This move is a critical response to the industry-wide shift toward molybdenum as a replacement for tungsten and copper in advanced logic and memory nodes. As chipmakers move toward 2nm processes and higher-layer 3D-NAND, molybdenum-based thin films deposited via Atomic Layer Deposition (ALD) offer lower resistivity and better scaling potential. The new lines, operational as of FY2024, position JX Advanced Metals to capture a surge in demand driven by the global expansion of AI data centers and high-performance computing.
Sources (9)
[PDF] TOHO TITANIUM CHANGES THE WORLDSolid Precursors for 3D Architectures: MaterialsPowering the Next Era of Contact Scaling with ALD MolybdenumMolybdenum – The Metal Enabling Next Big Leap In Chip Manufacturing for the AI Era3D Integration and GAA Adoption Drive Structural Growth in ALD ...High-Purity MoO 2 Cl 2 （Molybdenum Dioxide Dichloride）[PDF] JXTG REPORTFlame Retardant and Smoke Suppressant | JX Metals Trading Co., Ltd.
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