News
New Semiconductor Resist 'MOR' Adopted by Samsung
Thursday, December 4, 2025 at 08:33 PM
Samsung is reportedly planning to adopt a new semiconductor resist material called MOR, which is described as a significant innovation in lithography materials after three decades.
Context
Metal-oxide resist (MOR) is poised to be the first major new photoresist platform in approximately 30 years, succeeding chemically amplified resists (CAR) for EUV lithography. This innovation is critical for advanced chip manufacturing, offering superior Resolution-Line-Edge-Roughness-Sensitivity (RLS), enhanced dose sensitivity, and improved etch resistance. MOR can resolve features as fine as 10 nm, a significant leap from CAR's 16 nm, and boosts throughput by reducing the required EUV dose.
Samsung Electronics plans mass production with MOR by 2026-27, with supply starting in 2026. SK Hynix already uses Inpria's MOR for 1c DRAM, while Samsung evaluates Inpria (JSR), DuPont, Dongjin Semichem, and Samsung SDI. Targeting 6-7 finest EUV layers in next-gen DRAM, MOR's rapid 2026-27 adoption will significantly benefit suppliers like Inpria/JSR and reshape the EUV supply chain.
Related Companies
Samsung Electronics
005930