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Horiba releases new chemical concentration monitor to reduce semiconductor cleaning equipment footprint
Thursday, March 26, 2026 at 03:40 AM
HORIBA has launched a new chemical concentration monitor designed for semiconductor cleaning processes. The device aims to reduce the equipment footprint in fabs while maintaining high-precision monitoring of cleaning fluids, which is critical for advanced node manufacturing yields.
Context
On March 26, 2026, Japanese instrumentation leader Horiba announced the release of a new chemical concentration monitor specifically designed to reduce the physical footprint of semiconductor cleaning equipment. This launch follows the company’s MLMAP2028 mid-to-long-term management plan, which prioritizes the Materials & Semiconductor segment as a core growth driver. By optimizing the internal structure and sensor integration, the new monitor aims to assist chipmakers in maximizing cleanroom floor space, a critical constraint as global fab expansions accelerate.
The development is significant as the semiconductor cleaning device market is projected to reach $5,933 million by 2031, driven by the transition to advanced nodes and 3D NAND structures. Horiba’s precision measurement tools are essential for the wet chemical cleaning processes dominated by major equipment manufacturers like SCREEN Semiconductor Solutions, Tokyo Electron (TEL), and Lam Research. This new product also aligns with Horiba’s goal to achieve a 25% reduction in resource consumption for its "eco-friendly" product line, supporting broader industry efforts toward carbon neutrality and operational efficiency.
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