News
Lasertec to release ACTIS200HiT EUV mask inspection tool for wafer fabs in 2025
Friday, January 16, 2026 at 09:43 PM
Lasertec announced the ACTIS200HiT, scheduled for release in October 2025. This EUV mask inspection tool offers three times the inspection speed of the previous ACTIS150 model. The system is specifically optimized for quality assurance in wafer fabs, focusing on detecting acquired defects rather than being a general-purpose upgrade.
Context
Lasertec officially released the ACTIS200HiT series on October 31, 2025, marking a major expansion of its Extreme Ultraviolet (EUV) mask inspection portfolio. While the legacy ACTIS150 has been the industry standard since 2019, the new 200HiT is specifically engineered for use within high-volume wafer fabs rather than just mask manufacturing shops. The system delivers triple the inspection speed of its predecessor, allowing manufacturers to rapidly identify printable defects that occur during active production cycles without creating a bottleneck in the factory.
This tool is critical for major semiconductor players like TSMC, Samsung, and Intel as they scale 2nm and 3nm process technologies. By addressing the demand for faster, in-fab quality assurance, Lasertec is successfully expanding its addressable market from initial mask fabrication to the recurring, high-frequency inspection needs of active production lines. This high-throughput model reinforces the company's near-monopoly in the actinic inspection space and positions it for sustained revenue growth through 2026.
Sources (1)
Related Companies
Lasertec
6920