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Fujifilm develops functional material for image sensors compatible with KrF lithography
Wednesday, December 10, 2025 at 04:40 AM
Fujifilm has announced the development of a new functional material specifically designed for manufacturing image sensors. This material is compatible with KrF (Krypton Fluoride) lithography technology.
Context
On December 9, 2025, Fujifilm announced the launch of WAVE CONTROL MOSAIC™, a groundbreaking color filter material for image sensors. This innovative product is the world's first color filter material for image sensors compatible with KrF lithography and is entirely PFAS-free, addressing critical environmental concerns.
The new material is designed to enable the formation of finer pixels and achieve higher sensitivity by improving light transmittance, which was previously challenging with conventional i-line exposure. This advancement is crucial for cutting-edge image sensors requiring ultra-miniaturization and high performance. Fujifilm will showcase WAVE CONTROL MOSAIC™ at SEMICON Japan from December 17 to 19, 2025.
This development underscores Fujifilm's strategic focus on strengthening its photolithography area. The company aims to leverage its strong market share in image sensor contracts and its expertise in KrF resist technology to capture a 20% market share of advanced resists by FY2030, positioning itself as a leader in niche segments.
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