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Tokyo Ohka Kogyo partners with Irresistible Materials to advance high-NA EUV resist technology
Tuesday, February 24, 2026 at 07:40 AM
Tokyo Ohka Kogyo has partnered with Irresistible Materials to accelerate the development of EUV resists. The collaboration focuses on Multi-Trigger Resist technology as a complement to existing chemically amplified and metal oxide resists for both standard and high-NA EUV lithography.
Context
Tokyo Ohka Kogyo (TOK) announced a strategic financial investment and joint development partnership with UK-based Irresistible Materials (IM) on February 24, 2026. The collaboration focuses on commercializing IM’s patented Multi-Trigger Resist (MTR) platform to advance EUV lithography. This technology is essential for the semiconductor industry’s transition to sub-2nm nodes, which serve as the backbone for high-performance AI hardware and advanced logic chips.
The MTR platform utilizes small-molecule chemistry with dimensions up to 10 times smaller than conventional polymer-based resists, delivering superior resolution and reduced line-edge roughness. These characteristics are critical for foundries aiming to overcome scaling bottlenecks while improving manufacturing yields. For TOK, which maintains a leading 25% global share of the photoresist market, the deal strengthens its high-end portfolio for both low-NA and high-NA EUV applications.
By integrating IM’s innovations, TOK secures a vital position in the global AI supply chain. This strategic move ensures the company can meet the specialized material demands of top-tier foundries like TSMC and Samsung as they race to commercialize next-generation logic and memory nodes.
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