SMIC founder Richard Chang predicts China will achieve domestic EUV lithography breakthrough within five years
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SMIC founder Richard Chang predicts China will achieve domestic EUV lithography breakthrough within five years

Monday, March 23, 2026 at 09:08 PM

Richard Chang, founder of SMIC, stated in an interview that China is developing a domestic EUV lithography system using a different methodology than ASML. He predicts a breakthrough for mass production within two to five years, despite ongoing US export restrictions and dependence on specialized Japanese materials and components.

Context

In a significant projection for China’s semiconductor independence, SMIC founder Richard Chang stated in a January 2026 interview with Toyokeizai that China could achieve a breakthrough in domestic EUV (Extreme Ultraviolet) lithography within two to five years. Chang, often called the "godfather" of the Chinese chip industry, claimed that development is currently underway using methods distinct from ASML, the Dutch firm that currently holds a global monopoly on EUV technology. This timeline suggests a rapid acceleration of domestic capabilities despite ongoing U.S. export controls that have blocked China from purchasing advanced ASML scanners since 2019. While Chang expressed confidence in achieving mass-production levels by 2031, industry experts remain cautious. Proponents of the breakthrough point to recent EUV prototype successes reported in late 2025; however, engineers note that specialized Japanese technology in the supply chain remains a critical barrier. Achieving high-yield logic production below the 7nm threshold requires not just the lithography tool, but a complex ecosystem of resists and masks where Nikon and Canon still hold a competitive edge. This development is being closely watched as SMIC pivots toward becoming a national champion for the domestic Chinese market.

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