News
Imec begins installation of ASML EXE:5200 High NA EUV system in Leuven clean room
Wednesday, March 18, 2026 at 11:48 PM
Imec has begun the installation of an ASML EXE:5200 High NA EUV lithography system at its 300 mm pilot line facility in Leuven, Belgium. The equipment is intended for high-volume manufacturing qualification and advanced process node research.
Context
On March 18, 2026, the semiconductor research hub imec announced the start of installation for ASML's EXE:5200 High NA EUV lithography system in its 300 mm clean room in Leuven. This $400-million machine is one of fewer than a dozen such units globally and is a cornerstone of the EU-funded NanoIC pilot line. The system is expected to be fully qualified by Q4 2026, providing the global chip ecosystem with early access to the tools required for the Ångström era.
This deployment is critical for the development of next-generation sub-2nm logic and high-density memory chips, which are essential for advanced AI and high-performance computing. By increasing the numerical aperture from 0.33 to 0.55, the tool enables a 2.8x boost in feature density and allows for single-patterning of metal lines at a 20 nm pitch. Major industry players including Intel and SK Hynix are expected to utilize this technology for high-volume manufacturing as early as 2027.
Sources (6)
Imec receives the world’s most advanced High NA EUV system | imecASML and imec open joint High NA EUV Lithography Lab offering an early development platform to the leading-edge semiconductor ecosystemBelgium's imec secures rare ASML High NA EUV tool to drive next-generation chips | ReutersImec receives the world's most advanced High NA EUV systemASML’s high-NA tool arrives at Imec - Bits&ChipsProgress in high-NA EUV lithography towards high-volume manufacturing
Related Companies
ASML
ASML