Riks to mass-produce advanced semiconductor cleaning equipment for AI chip manufacturing by 2026
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Riks to mass-produce advanced semiconductor cleaning equipment for AI chip manufacturing by 2026

Wednesday, March 18, 2026 at 10:26 PM

Japanese industrial machinery firm Riks plans to start mass production of specialized cleaning equipment for advanced semiconductor packaging by 2026. The new machinery is designed to remove debris from the narrow gaps between multiple chips and substrates, a critical step in high-performance AI chip assembly. This move targets the growing demand from firms like TSMC and Rapidus as they scale advanced packaging and assembly technologies for AI applications.

Context

Japanese machinery firm Rix announced it will begin mass production of advanced semiconductor cleaning equipment by 2026, specifically targeting the booming AI chip sector. As leading foundries like TSMC and Rapidus accelerate the adoption of 2.5D and 3D packaging technologies such as CoWoS, the structural complexity of these chips has increased. Rix's new system utilizes a reduced-pressure mechanism to remove flux residues from ultra-narrow gaps—some measuring only a few tens of microns—which are common between interconnected dies and substrates in high-performance AI hardware. This move strengthens Japan's critical role in the global AI supply chain, particularly in specialized back-end processes. By providing tools that improve production yields for large-format packages, Rix aims to capture the surging demand driven by next-generation data centers. This development coincides with broader regional efforts, including Mitsubishi Chemical Group's expansion of precision cleaning services in Japan by October 2026, signaling a coordinated ramp-up of the domestic semiconductor ecosystem to support leading-edge 2nm and AI chip manufacturing.

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